Facilities:

- Laboratories/equipments

• Lechnology Lab (Sputtering, Evaporation, Rapid-quenching, Arc-melting).
• High Magnetic Field Lab (> 10 T).
• Chemical Lab.
• Specimen Treatment Lab.
• Vibrating Sample Magnetometer (VSM) DMS 800.
• I-V and Magnetoresistance Characteristics System HP 4156 A.
• Close Cycle Cryogenic System.
• Dry Clean Compressed Gas, Nitro Gas and Nitro-Liquid System.

- Mechanical and electric workshops
- Computer Lab

Some pictures of equipment:

Magnetic pulse system  

Description: Measure magenitc properties of magnetic material under ultrahigh magentic field (30 Tesla)

Specifications:

• Maximum magnetic field 30 Tesla at 77K and 26 Tesla at RT
• Pulse duration: 3.9-32 ms
• Error: 2%
• Controlled by computer
• Manufacturer: ITIMS, Vietnam
• Year of manufacture: 1996, installation and use: 1997

Contact: Ass Prof. Dr.  Nguyen Phuc Duong

Keywords: Magnetic pulse system, Measure magenitc properties, ultrahigh magentic field 

Vibrating Sample Magnetometer

Description: Measure properties of magnetic material under average magnetic field (<1.3 Tesla) 

Specifications:

• Maximum magnetic field: 1.4 Tesla
• Sensitivity: 10^-5 Emu
• Temperature range: 77-1000K
• Sample in volume or thin-film form
• Controlled by computer
• Manufacturer: ADE Technologies, USA
• Year of manufacture: 1994
• Code name: DMS 880

Contact: Ass Prof. Dr.  Nguyen Anh Tuan

Keywords:  Magnetometer for vibrating sample,  thin-film form, DMS 880, ADE Technologies, VSM (Vibrating Sample Magnetometer);  Hysteresis loops; Thermal magnetic curves;

Sample annealing equipment using arc 

Description: Annealing and casting alloys

Specifications:

• Control box: 380 VAC 50Hz
• Arc source: ZX-500A
• DC control: 100-400A
• Sample furnaces: 7 furnaces with maximum 5g/furnace
• Vacuum system: Mechanical pumping ZX2, pumping rate 8.8l/s
• Diffusion pump JK2000, pumping rate 1500l/s
• Manufacturer: Physics Insititute of Bejing, China
• Year of manufacture: 2001 

Contact: Ass Prof. Dr.  Nguyen Phuc Duong

Keywords: Sample annealing equipment using arc, Vacuum system, Diffusion pump JK2000, pumping rate

Evaporation system

Description: Grow mono and multilayer thin films

Specifications:

• Highest vacuum level: 10^-6Torr
• One evaporated source using resistance
• Film thickness measurement
• Manufacturer: Balzer, Switzerland
• Year of manufacture: 1980, installation and use: 1996
• Code name: A 500

Contact: Ass Prof. Dr.  Nguyen Anh Tuan

Keywords: Vacuum evaporated equipment, thin films, vacuum level, Film thickness measurement Evaporation system; thin films deposition by evaporating technique; vacuum system.

High frequency sputtering machine

Description: Grow mono and multilayer thin films

Specifications:

• Highest vacuum level: 10^-6Torr
• 2 substrates, 1 sputtering source 400W
• We have added 18 targets serving the investigation and growth mono, multilayer thin film or alloys
• Manufacturer: Alcatel, France
• Year of manufacture: 1980, installation and use 1996
• Code name: SCM 400

 Contact: Ass Prof. Dr.  Nguyen Anh Tuan

Keywords: High frequency sputtering machine, thin films, multilayer thin film, SCM 400, Sputtering system; Thin films deposition by sputtering technique; vacuum system.